Single-color peripheral photoinhibition lithography of nanophotonic structures

1.
State Key Laboratory of Modern Optical Instrumentation, College of Optical Science and Engineering, Zhejiang University, Hangzhou, 310027, Zhejiang, China
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Research Center for Intelligent Chips and Devices, Zhejiang Lab, Hangzhou, 311121, China
3.
Guangdong Provincial Key Laboratory of Optical Fiber Sensing and Communications, Institute of Photonics Technology, Jinan University, Guangzhou, 510000, Guangdong, China
4.
Collaborative Innovation Center of Extreme Optics, Shanxi University, Taiyuan, 030006, Shanxi, China
5.
Ningbo Research Institute, Zhejiang University, Ningbo, 315100, China

Funds: This work was financially supported by the National Natural Science Foundation of China (62125504, 61827825, and 22105180), National Key R&D Program of China (2021YFF0502700), Major Program of the Natural Science Foundation of Zhejiang Province (LD21F050002), Major Scientific Project of Zhejiang Lab (2020MC0AE01), China Postdoctoral Science Foundation (BX2021272 and 2020M681956), and Zhejiang Postdoctoral Science Fund for Excellent Project (511300-X82101).

摘要

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Abstract: Advances in direct laser writing to attain super-resolution are required to improve fabrication performance and develop potential applications for nanophotonics. In this study, a novel technique using single-color peripheral photoinhibition lithography was developed to improve the resolution of direct laser writing while preventing the chromatic aberration characteristics of conventional multicolor photoinhibition lithography, thus offering a robust tool for fabricating 2D and 3D nanophotonic structures. A minimal feature size of 36 nm and a resolution of 140 nm were achieved with a writing speed that was at least 10 times faster than existing photoinhibition lithography. Super-resolution and fast scanning enable the fabrication of spin-decoupled metasurfaces in the visible range within a printing duration of a few minutes. Finally, a subwavelength photonic crystal with a near-ultraviolet structural color was fabricated to demonstrate the potential of 3D printing. This technique is a flexible and reliable tool for fabricating ultracompact optical devices.
- Peripheral photoinhibition lithography /
- Nanophotonic structures /
- Direct laser writing /
- Two-photon polymerization /
- Super-resolution

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参考文献(29)

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doi: 10.1186/s43074-022-00072-2

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Single-color peripheral photoinhibition lithography of nanophotonic structures

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doi: 10.1186/s43074-022-00072-2

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Single-color peripheral photoinhibition lithography of nanophotonic structures

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